Question # 1

The most electronegative element of the third period is.

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F

P

Br

Cl

Which librates H2 with NaOH

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B

AI

Zn

All

Group VA of the periodic table consist of elements.

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3

4

5

6

Molecule of oxygen is

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Diamagnetic

Paramagnetic

Both A and B

None of above

Which of the following statements correct regarding copper.

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It is used in electroplating

Its salts are used as insecticides

Its salts are used as coloring materials

All are correct

The hydrogen bond is strongest in.

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O - H .............S

S - H.............O

F- H....................F

F - H...............O

The alkali metal that react with nitrogen directly to form nitrides.

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Na

K

Rb

Li

The penultimate shells have pscudo inert gas type configuration.

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Ga

In

TI

All above

The different layers in graphite are held together by

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Ionic bonding

Metallic bonding

Covalent bonding

Van der Waals forces

Used in Geiger counter to detect radioactivity

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He

Ne

Ar

Kr

The pH of the 1.3 x 10^-4 NH₄Cl is

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1.3

4.0

2.886

3.886

Pick out incorrect statement.

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NF3 molecule has trigonal pyramidal structure.

It is practically incoluble in water and is only hydrolyzed, an electric spark is passed through a mixture with water vapour.

Dipole moment of NF3 is more than that of NH3

Nitrogn (III) oxide (N2O3) is an acidic oxide.

Variable oxidation states is shown by

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Normal eleemnts

Metallic elements

Non metallic elements

Transition elements

Hydrogen bond is not electrostatic in nature is stated by

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Electrostatic approach

Valence bond approach

Molecular orbital approach

None of the abvoe

The size of iso electronic species - F- , Ne, and Na+ is affected by

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Nuclear charge (Z)

Valence principal quantum number (n)

Electron electron interaction in the outer orbital

None of the factors because their size to the same.

Strength of H bond in inter mediate between

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Van der Waals forces and covalent bond

Ionic and covalent bond

Ionic and metallic bond

Metallic and covalent

The noble gases which does not I do not form any clathrates is.

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He

Ne

Argpm

Both He and Ne

Which of the following represent the fuming sulphuric acid

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H2S2O4

H2S2O3

H2S2O6

H2S2O7

Which of the following species have undistributed octahedral structure.

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SF6

PF6

Si F₆^2-

XeF6

The contact process is mainly used when acid is required for the manufactures of.

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Explosives

Fine chemicals

Lead accumulators

All above

Relative order of acidity of oxy acid

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HCIO > HCIO2 > HCIO3 > HCIO4

HCIO4 > HCIO3 >HCIO2 > HCIO

HCIO3 > HCIO2 > HCIO > HCIO4

HCIO2 > HCIO4 > HCIO3 > HCIO

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